TEL (Tokyo Electron Ltd), Boron - Poly, Model Alpha - 8S (1996)
De-installed, not in crate, system complete.

Tokyo Electron Alpha 8S-Z Wafer Diameter--200 mm Vendor Tool Serial Year--1996 Operational Status--Operational OEM--Tokyo Electron Tool Model--Alpha 8S-Z Process--Boron Poly Heater—VMM-40-104 Software Version--TS-4000 - 2000 System Power Rating--110 VAC One Phase / 208 AC Loading Configuration--6 Loader Main System TS4000 Controller Photohelic Gauge Boat Elevator Wafer Load Automation 16 Cassette Stocker Temperature Controller (M121) Furnace Monitor, Power Control Unit Remote Utility & Gas Cabinet Inner T/C for Ration Mix Auto Shutter Gas System (SiH4 ,H2, BCl3, N2 ) Options (1) Signal Tower (2) Pitch Change Mechanism (3) UPS (4) GEM Communication N2 Load Lock Ambient Control Option--1 Load size 170 wafers Load lock purge system Process gas SiH4, BCL3, H2, N2 Gas Type - Convention Gas System Tubing material - Stainless steel Tubing Finish - Electro-polish Manual valve - Fujikin Fitting Type - VCR/UJR Air-Operated valve - Fujikin Filter - Millipore Regulator - Veriflo MFC - Aera Pressure transducer - Millipore or NAGANO

DNS, SOG Coater, Model SCW-80A-AVG (2001)
De-installed, not in crate, system complete.

SOG Coater

TEL (Tokyo Electron Ltd), Etcher, Model Unity II 85 TPA (1996)
De-installed, not in crate, system complete.

Tokyo Electron UNITY II 85 Wafer Diameter--200 mm Vendor Tool Serial Year--1996 Operational Status--Operational OEM--Tokyo Electron Tool Model--UNITY II 85 TPA Process--TPA / DRY ETCH Software Version--VER 3.40 System Power Rating--AC208V, 50Hz, 3-Phase, 100kVA breaker Loading Configuration--Single Cassette / Single Wafer System consists of following modules: 1) Main body 2) AC distribution box 3) Main Controller Module 4) Additional AC Power Box (Lock out box) 4) UPS 5) Chiller

Speedfam, CMP, Model CMP V - ILD (1995)
In a crate, system complete, operational when de-installed by outside service / OEM (documentation available).

Speedfam ILD-CMPV-planarization tool for Interlayer Dielectric CMP with wafer loader. Commonly used for Tungsten.

Gasonics, Asher, Model Aura 3010 (1997)
De-installed, not in crate, system complete.

Gasonics, Novellus Aura 3010 Plasma Strip Wafer Diameter--200 mm Vendor Tool Serial Year--1997 Operational Status--Operational OEM--Gasonics, Novellus Tool Model--Aura 3010 Process--Downstream plasma strip Software Version--5.30 SP2 GEM System Power Rating--208 VAC 3-Phase Loading Configuration--One loader, One chamber Process Configuration Description / Chemicals / Gases Used Chamber Position A---Quartz Chamber---O2, H2N2, N2 System Configuration MW generator module Power supply module Gas box module Lamp controller module AC rack

Applied Materials, Implanter, Model PI 9500 (1995)
De-installed, not in crate, system complete.

Configuration Gas Configuration AsH4, PH3, BF3, GeF4 17 Wafer/Wheel Fast Wheel Index Tilt/Angle = 0/7 Plasma Flood System Included Serpentine Belt Spin Wafer Size: 200mm - 25 wafer cassette Thru the Heatsink Wafer on Heatsink Sensor Single Orienter No Signal Tower No Vaporizor controls Pre-Accl 0-80kV Post-Accl 0-80kV STP1000C Ion Source Pump STP300 MRS Chamber Pump CTI__9700 Cryo Compressors Recirculating pump Heat exchanger MRS assembly Source cooling can Source bushings No Vaporizers Flight tube Extraction assembly w/alignment fixtures Moveable PA Source isolation valves 208VAC..

TOKYO SEIMITSU, CMP, Model A-FP-210A (2004)
De-installed, not in crate, system complete.

Enhanced surface uniformity performance Using an air float-typed carrier, the A-FP-210A stably delivers enhanced surface uniformity of less than 2%(1sigma) in Cu processes. It also features a wide process window for each process while reducing dependence on slurries and pads, delivering equivalent performance in various other applications. Real-time endpoint detection mechanism Tokyo Seimitsu’s unique detection mechanism and analysis software ensure endpoint detections by monitoring residue screen in real-time, without creating dependence on slurries.

Schlumberger, E-Beam Wafer Probe System, Model IDS-5000ZX (1993)
De-installed, not in crate, system complete.

Schlumberger IDS-5000 electron beam prober. Good condition.

Teal, Power Conditioner, Model 3/353400 (1995)
De-installed, not in crate, system complete.

Micro-Vu, Optical Comparator, Model H14 (1992)
De-installed, not in crate, system complete.

Novellus, Parts-Chamber, Model Sequel (1992)
De-installed, not in crate, system complete.

Chamber

Novellus, CVD, Model C2 Sequel (1996)
Installed, system complete, operational condition unknown.

Fusion Systems - Axcelis, Photostabilizer, Model M200 PCU (1998)
Installed, system complete, operational condition unknown.

Model: M200PCU Photostabilizer for 200mm wafers UV Bake process or curing. Irradiator contains Hg High Intensity Lamp and 2.45 GHz magnetrons for UV radiation generation Cassette-to-cassette operation Microprocessor controlled Pneumatic controlled uplift for irradiator SECS I, II software interface Through-the-Wall mounting. 200POLO- VER 3.13-U6

JEOL, SEM Review, Model JWS-7500E (1997)
Installed, system complete, operational condition unknown.

JEOl 7500 full wafer inspection SEM for 200mm wafers.Max Accelerating Voltage: 6KV -Cable length: 15m between operation console and power supply (5m between Main Console and Operation Console) - -Tilt: -15 to +60 degrees -Rotation: 360 degrees continuous -EOS resolution: 10nm -Stage accuracy: +/- 10µm -Stage configuration: 8” Vintage: 1997 Location: USA

Rudolph Technologies, Wafer Inspection, Model Metapulse 200 (1998)
Installed, system complete, operational condition unknown.

Rudolph Metapulse 200 Metrology System: - Pattern Recognition - 8" ergonomic cassette tilt loaders - Pulse Wafer Transport System - 200mm chuck - 200mm wafer probe - 200mm linear positioning stage - Ultrafast 800nm laser - Programmable motion controller - Color printer (cleanroom approved) - 266MHz Pentium II Motherboard - 2GB hard drive - CD ROM drive - LCD screen - Keyboard and Trackball - GEM compliant SEC-II

TEL (Tokyo Electron Ltd), Diffusion Furnace, Model Alpha - 601D (1992)
In a crate, system complete, operational when de-installed by outside service / OEM (documentation available).

801-D VDF for 200mm wafers. 2 available at this price for each.

Sensys Instruments, Wafer Inspection, Model SMS-2000 (2000)
De-installed, not in crate, system complete.

Sensys Instruments SMS-2000 metrology inspection system for 200mm wafers.

Novellus, CVD, Model C2 Dual Sequel Shrink (1995)
De-installed, not in crate, system complete.

Novellus Concept 2 Dual Sequel- CVD System with one Shrink & one standard chamber. ; Decontamination Report Yes ; Frequency 50/60 ; Phase 3 ; Software Version 2.2 ; UL Listed Yes ; Voltage 208V ; Deinstall Date 4/15/05 ; Install Date 12/1/95 ; Signal Tower yes ; System Fab Set-up Through the Wall ; Wafer Handling Standard – 200mm ; C2 Process Chamber Type Sequel ; C2 Robot Brooks Dual Arm MTR-5- ; Chamber : Gas01 Flow & MFC Make-Model Brooks, 5964, 1slm Gas01 Type SiH4 Gas02 Flow & MFC Make-Model Brooks, 5964, 5slm Gas02 Type N2 Gas03 Flow & MFC Make-Model NONE Gas03 Type N/A Gas04 Flow & MFC Make-Model NONE Gas04 Type N/A Gas05 Flow & MFC Make-Model NONE Gas05 Type N/A Gas06 Flow & MFC Make-Model Brooks, 5964, 10slm Gas06 Type NH3 Gas07 Flow & MFC Make-Model NONE Gas07 Type N/A Gas08 Flow & MFC Make-Model Brooks, 5964, 20slm Gas08 Type O2 Gas09 Flow & MFC Make-Model Brooks, 5964, 5slm Gas09 Type C2F6 Gas A Flow & MFC Make-Model TEOS GasA Type N2 GasB Flow & MFC Make-Model Brooks, 5964, 20slm GasB Type O2 GasC Flow & MFC Make-Model Brooks, 5964, 10slm GasC Type N2 Configuration, continued ; DLCM Interconnect Cable Length 75 ; Dual Divert Gas Box No ; EMO Button Guard Rings Yes ; Loadlock Pump Included Yes ; Novellus Local Power Box Yes ; Novellus Remote Interconnect Cable Length 75 ; Novellus TEOS Cabinet Type Standard ; Sequel-Speed Gas Box PN Chamber 1C2-CVD-DS 96-51-5248 ; Sequel-Speed Gas Box PN Chamber 2C2-CVD-D 95-42-5088 ; Transfer Chamber Pump Model Edwards QDP80 ; DLCM is Standard (non-shrink)* ; DLCM serial number is 95-42-5088* ; Transfer module pumps: Edwards QDP40/500* ; NO PUMPS- ; Process module 1 is Shrink, TEOS only ; Process module 1 serial number C2-CVD-DS 96-51-5248 ; No end point detectors ; Ch 1 - Standard TEOS bulk fill cabinet (sigma 6 style) ; Ch 2 - Standard TEOS bulk fill cabinet (sigma 6 style) :: .RF power supplies: Ch 1 AE PDX1400/AE RFG 5500 Ch 1 ENI Plasmaloc 2-HF Ch 2 AE PDX1400 Ch 2 ENI-OEM 50 ; Standard single point electrical distribution box ; TEOS delivery Ch 1 Novellus standard Ch 2 Novellus standard

Kevex, X-Ray Fluorescence, Model Omicron XRF (1996)
De-installed, not in crate, system complete.

Kevex X-Ray Fluorescence Spectrometer, Model 952-103 Spectrometer • Omicron • Joystick • Remote Computer • Top loading

Kevex, X-Ray Fluorescence, Model Omicron XRF (1996)
De-installed, not in crate, system complete.

Kevex X-Ray Fluorescence Spectrometer, Model 952-7 Spectrometer • Omicron • Joystick • Remote Computer • Top loading

Fusion Systems - Axcelis, Photostabilizer, Model M200 PCU (1995)
De-installed, not in crate, system complete.

Model: M200PCU Photostabilizer for 200mm wafers UV Bake process or curing. Irradiator contains Hg High Intensity Lamp and 2.45 GHz magnetrons for UV radiation generation Cassette-to-cassette operation Microprocessor controlled Pneumatic controlled uplift for irradiator SECS I, II software interface Through-the-Wall mounting. Power supply model--PTC Frequency--50/60 Phase--Single Voltage--110-120V One System Manual

Novellus, CVD, Model C2 Prism (1997)
De-installed, not in crate, system complete.

Semitool, Spray Tool, Model Magnum (1997)
In a crate, system complete, operational when de-installed by outside service / OEM (documentation available).

Semitool Magnum dual chamber spray tool for 200mm wafers with 4 stations and two tanks.

Teal, Power Conditioner, Model 3/393400 (1998)
De-installed, not in crate, system complete.

TEAL AC power conditioner

WJ (Watkins Johnson), Diffusion Furnace, Model 1500TF CVD (1992)
In a crate, system complete, operational when de-installed by outside service / OEM (documentation available).

This tool is refurbished as originally configured.

Woolam, Ellipsometer, Model VU-302 (2001)
De-installed, not in crate, system complete.

Woollam automated Ellipsometer for 200 mm wafers. Spectroscopic Ellipsometer 415-750 nm w/44 channels LPS-400: w/Electronic Control module Computer, Monitor & keyboard.

Applied Materials, CMP - BPSG, Model Mirra 3400 (1999)
De-installed, not in crate, system complete.

Model : MIRRA OEM : APPLIED MATERIALS Process : BPSG Loading Configuration : 4 Wet Stage Loader System Power Rating : 208V 3-Phase Software Version : PS58j0 System Comes With: 1 Main Polisher 1 Polisher Controller 1 Computer Rack 1 Cassette tub

Applied Materials, CMP, Model Mirra 3400 (1999)
De-installed, not in crate, system complete.

Model : MIRRA OEM : Applied Materials Process : PCMP Loading Configuration : 4 Wet stage loader Chamber Type : Platen slurry POUs System Power Rating : 208Vac, 3 Phase Software Version : PS58J0 System Comes With: Main Body System controller

Nikon, Wafer Stepper, Model NSR-2205i14E (2000)
Complete system available, clean, operational to original OEM specifications (no warranty).

NSR-2205i14E stepper for 200mm wafers. Refurbished - Good condition. Install and Warranty is available at additional charge.

Nikon, Wafer Stepper, Model NSR-2205i14E (2000)
Complete system available, clean, operational to original OEM specifications (no warranty).

NSR-2205i14E stepper for 200mm wafers. Refurbished - Good condition. Install and Warranty is available at additional charge.